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Rapid Thermal Anneal

Product Detail Information

 Speccification
- Hardware Performance -

 

1-1 MTBF: > 500 Hours

 

1-2 MTTR: > 2 Hours

 

1-3 Up-Time: 95%

 

1-4 Through-put: 70Wafer(2Chamber)

 

1-5 Oxidant Control: min 3.0ppm

 

1-6 particle: < 0.04/㎠, 0.16㎛

 

 

- Reactor Chamber -

 

2-1 Max Temperature: 1250℃

 

2-2 Temperature Ramp-Up rate: 30~120℃/sec

 

2-3 Temperature Down rate: 10~50/sec

 

2-4 Temperature Repeatability: < ± 2.0℃

 

2-5 Temperature Control Range: 400~1200℃

 

2-6 Source Life Time: > 1000Hrs

 

- Heating Pervformance -

 

3-1 Lamp Type: Circular Type

 

3-2 Temperature Control Method: Open/Close Loop(9Zone)

 

3-3 Temperature Uniformity: < ± 20.℃(at 1000℃)

 

 

- Process gas supply system -

 

4-1 Accuracy of flow rate: set flow < ± 10.℃%

 

4-2 Gas distribution box: 3Gas Channel(Ar,PN₂, O₂)

 

 

- Applicatiion Process -

 

5-1 IMP Anneal: OK(Rs Uniformity: < 1.0%)

 

5-2 BPSG Reflow: OK

 

5-3 Barrier Metal Anneal: OK